BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//132.216.98.100//NONSGML kigkonsult.se iCalcreator 2.20.4//
BEGIN:VEVENT
UID:20250821T063705EDT-676551oId5@132.216.98.100
DTSTAMP:20250821T103705Z
DESCRIPTION:Optical lithography has made consumer electronics ever more pow
 erful\, ubiquitous\, and affordable. This is largely due to the ability of
  conventional lithographic techniques to transfer trillions of mask featur
 es to wafers at defect densities approaching virtually zero in high-volume
  manufacturing. The resolution of optical lithography tools and the accura
 te alignment of tight-pitch features continue to be the biggest challenges
  for scaling. The continued scaling of complex device geometries is drivin
 g the need for novel lithographic techniques\, self-alignment strategies\,
  thin film deposition and etch strategies with atomic-layer precision. Giv
 en the fundamental physical limitations of conventional optical lithograph
 y\, novel patterning approaches are needed to overcome shortcomings in res
 olution\, pattern uniformity\, and pattern placement accuracy. Research in
  this area is a critical enabler of Moore’s Law in the foreseeable future.
  Bringing novel materials to high-volume manufacturing requires a highly c
 oordinated research and development pipeline. This talk will outline the c
 hallenges presented by traditional patterning processes and discuss comple
 mentary patterning techniques such as directed self-assembly (DSA) and sel
 ective deposition (SD)\, as well as the role novel materials could play as
  a means to future scaling\, will be explained.\n
DTSTART:20150813T150000Z
DTEND:20150813T163000Z
LOCATION:Room 428\, Maass Chemistry Building\, CA\, QC\, Montreal\, H3A 0B8
 \, 801 rue Sherbrooke Ouest
SUMMARY:Extending Moore’s Law through Novel Materials
URL:/chemistry/channels/event/extending-moores-law-thr
 ough-novel-materials-254505
END:VEVENT
END:VCALENDAR